Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up one – self-assembled block copolymers (bottom-up). The process is assisted with solvent vapors to facilitate the imprint and simultaneous self-assembly of high Flory-Huggins parameter BCPs, the ones that yield sub-15 nm size features, in what has been called solvent vapors assisted nanoimprint lithography (SAIL).
For any further information, read the paper at
-or the Open Access Arxiv version http://arxiv.org/abs/1403.2250
Or check the press releases:
-At ICN2 website