Last reminder: EMRS symposium R for block copolymers

A very happy and successful 2015 for everyone!

To kick-off nicely the new year, don’t forget to submit your abstract to symposium R at E-MRS Lille 2015!

Link – Symposia R

Link – E-MRS Event

Abstract submission deadline  is Thurs Jan 15th.

SPRING 15 R: Block-copolymer self assembly for nanotechnology applications
Self-assembly of block copolymers can be used to design and control the shape and dimension of resulting nanostructures. These materials are currently incorporated into fabrication processes or directly into devices as functional materials.They represent a potent platform for fundamental studies at the nanoscale and for application-driven investigation.


This symposium will focus on block copolymer self-assembling as a tool to fabricate functional nanostructured materials. These block copolymers can hierarchically assemble into chemically distinct domains with size and periodicity on the order of 10 nm or below, offering a potentially inexpensive route to generate large-area nanostructured materials. The final structure characteristics of these materials are dictated by the properties of the elementary block copolymers, like chain length, volume fraction or degree of block incompatibility. Modern synthetic chemistry offers the possibility to design these macromolecules with very specific length scales and geometries, directly embodying in the macromolecules the “code” that drives their self- assembling process. The understanding of the kinetics and thermodynamics of the block copolymer self assembly process in the bulk phase as well as in thin films represents a fundamental prerequisite toward the exploitation of these materials. Incorporating block copolymer into device fabrication procedures or directly into devices, as active elements, will lead to the development of a new generation of devices fabricated using the fundamental law of nature to our advantage in order to minimize cost and power consumption in the fabrication process.Moreover the capability to precisely organize these nano-objects on appropriate substrates is the key point to support the technological development of new device concepts with predictable characteristics based on these nano-materials.

In the next coming years this area of research, at the intersection between fundamental science and technology, is expected to disclose additional insights in the physics of the self-assembly process and to delineate unforeseen applications for these materials. The workshop is expected to define a platform for the discussion of the main challenges in this research field bringing together scientists, engineers and students working on all the aspects of block copolymer self assembly, from fundamental physics and chemistry issues to the final application in functional device.

Hot topics to be covered by the symposium:

  • Synthesis of new block copolymer materials
  • Theory, modeling, and simulation of the self-assembly of blockcopolymers
  • Block copolymer self assembly for lithographic applications
  • Conductive and ionic block copolymers for electronic, optoelectronic andphotovoltaic applications
  • Block copolymers for membrane fabrication
  • Metrology of block copolymers
  • Directed self-assembly of block copolymers
  • Block copolymers thin films
  • Kinetics and thermodynamic equilibrium of block copolymers
  • Defectivity of block copolymer self-assembled patterns

List of invited speakers (confirmed):

  • Böker Alexander, RWTH Aachen, Aachen, Germany
  • Jean-Francois Gohy, Catholic University of Louvain, Belgium
  • Alexander Alfredo-Katz, Massachusetts Institute of Technology, Boston, USA
  • Gronheid Roel, ,IMEC, Louvain, Belgium
  • Christopher K.Ober, Cornell University, Department of Material Science & 
Engineering, Ithaca, USA
  • Ulrich Steiner, Cavendish Laboratory, Department of Physics, University of Cambridge, Cambridge, UK
  • Morris Michael, National University of Ireland, University College Cork, Department of 
Chemistry, Cork, Ireland
  • Volker Abetz, Helmholtz Zentrum Geesthacht, Geesthacht, Germany
  • Seth Darling, Argonne National Laboratory Center for Nanoscale Materials Argonne, USA
  • Müller-Buschbaum Peter, Technical University of Munich, Department of 
Physics, Garching, Germany
  • Raluca Tiron, CEA Leti, CNRS, Grenoble, France

Scientific committee members:

  • Ed Kramer, Materials Research Laboratory, University of California, Santa Barbara, USA
  • Alicia. I. Zucchi, University of Mar del Plata and CONICET, Mar del Plata, Argentina
  • Caroline A. Ross, MIT, Department of Material Science & Engineering, Cambridge, USA
  • Gabriele Seguini, Laboratorio MDM IMM-CNR, Agrate Brianza, Italy
  • Michele Laus, University Eastern Piemonte “Amedeo Avogadro”, Alessandria, Italy
  • Claudia Simao, Universitat Autonoma de
 Barcelona, Bellaterra, Spain
  • Apostolos Avgeropoulos, University of Ioannina, Greece
  • Marc Hillmyer, University of Minnesota, USA
  • Todd Younkin, Intel Corporation, USA
  • Ilias Iliopulos, Arkema, France

Symposium organizers:

Michele Perego
Laboratorio MDM
Via Olivetti 2
Agrate Brianza
Phone +39 039 603 6383 This e-mail address is being protected from spam bots, you need JavaScript enabled to view it

Guillaume Fleury
University of Bordeaux
16 avenue Pey Berland
33607 Pessac Cedex
Phone: +33 540 003 085 This e-mail address is being protected from spam bots, you need JavaScript enabled to view it

Marcus Müller
Institute for Theoretical Physics
Georg-August Universität
Friedrich-Hund-Platz 1
37077 Göttingen
Phone: +49 551 3913888
Fax: +49 551 399631 This e-mail address is being protected from spam bots, you need JavaScript enabled to view it

Matthew Shaw
Intel Ireland Ltd.
Collinstown Industrial Estate
Leixlip, Co Kildare
Phone: +353 21 234 6281 This e-mail address is being protected from spam bots, you need JavaScript enabled to view it

Ian Manners
University of Bristol
School of Chemistry
Cantock’s Close
Phone: 0117 928 7649 This e-mail address is being protected from spam bots, you need JavaScript enabled to view it

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