Posts Tagged: block copolymer
ICN2 OKP – From top-down to bottom-up: Introductory notes on the preparation of micro and nanostructures
Following latest publications on ICN2 Open Knowledge Program, below is the complete program for this second series on nanofab. These are free seminars at ICN2 auditorium. Come along! Session Date Time Tutor Title 1 Wed, February 18th 12h Claudia Simao
ICN2 OKP – From top-down to bottom-up: Introductory notes on the preparation of micro and nanostructures
Following latest publications on ICN2 Open Knowledge Program, below is the complete program for this second series on nanofab. These are free seminars at ICN2 auditorium. Come along! Session Date Time Tutor Title 1 Wed, February 18th 12h Claudia Simao
ICN2 Open Knowledge Program 2nd Series: nanofab!
Hi all ICN2 Open knowledge Program continues and it’s second edition is dedicated to nanofab. I’ll kick-off the cycle by lecturing a seminar next Wednesday about block copolymers. It’s free and is held on the ICN2 auditorium. Come along. More
ICN2 Open Knowledge Program 2nd Series: nanofab!
Hi all ICN2 Open knowledge Program continues and it’s second edition is dedicated to nanofab. I’ll kick-off the cycle by lecturing a seminar next Wednesday about block copolymers. It’s free and is held on the ICN2 auditorium. Come along. More
E-MRS Spring 2015 Lille, France: Symposium R = block copolymers!
To all working in block copolymer self-assembly, submit your abstract to Symposium R before January 15 2015 and participate in this great community! More details here: http://www.emrs-strasbourg.com/index.php?option=com_content&task=view&Itemid=1652&id=834
E-MRS Spring 2015 Lille, France: Symposium R = block copolymers!
To all working in block copolymer self-assembly, submit your abstract to Symposium R before January 15 2015 and participate in this great community! More details here: http://www.emrs-strasbourg.com/index.php?option=com_content&task=view&Itemid=1652&id=834
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Functional printing for smart surfaces 