Posts Tagged: DSA

Line pattern analysis featured on Nanotech-Now.com

The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170 Advertisements

Line pattern analysis featured on Nanotech-Now.com

The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170

Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)

At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.

Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)

At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.