Posts Tagged: Image analysis
ICN2 Open Knowledge Program 2nd Series: nanofab!
Hi all ICN2 Open knowledge Program continues and it’s second edition is dedicated to nanofab. I’ll kick-off the cycle by lecturing a seminar next Wednesday about block copolymers. It’s free and is held on the ICN2 auditorium. Come along. More
ICN2 Open Knowledge Program 2nd Series: nanofab!
Hi all ICN2 Open knowledge Program continues and it’s second edition is dedicated to nanofab. I’ll kick-off the cycle by lecturing a seminar next Wednesday about block copolymers. It’s free and is held on the ICN2 auditorium. Come along. More
Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)
At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.
Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)
At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.