Posts Tagged: Nanoimprint
ICN2 OKP – From top-down to bottom-up: Introductory notes on the preparation of micro and nanostructures
Following latest publications on ICN2 Open Knowledge Program, below is the complete program for this second series on nanofab. These are free seminars at ICN2 auditorium. Come along! Session Date Time Tutor Title 1 Wed, February 18th 12h Claudia Simao
ICN2 OKP – From top-down to bottom-up: Introductory notes on the preparation of micro and nanostructures
Following latest publications on ICN2 Open Knowledge Program, below is the complete program for this second series on nanofab. These are free seminars at ICN2 auditorium. Come along! Session Date Time Tutor Title 1 Wed, February 18th 12h Claudia Simao
SECOND OPEN KNOWLEDGE PROGRAM: “From top-down to bottom-up: introductory notes on the preparation of micro and nanostructures” SECOND SESSION
Hi all ICN2 Open Knowledge Program II series kicked-off very well and was delightful to see a lot of interest in block copolymers. Tomorrow Wednesday 25th February will take place the second edition presented by Dr. Nikos Kehagias on Advanced
SECOND OPEN KNOWLEDGE PROGRAM: “From top-down to bottom-up: introductory notes on the preparation of micro and nanostructures” SECOND SESSION
Hi all ICN2 Open Knowledge Program II series kicked-off very well and was delightful to see a lot of interest in block copolymers. Tomorrow Wednesday 25th February will take place the second edition presented by Dr. Nikos Kehagias on Advanced
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Abstract deadline extended on NNT 2013
This year, Barcelona will host the Nanoprint and Nanoimprint Technology (NNT) international conference, the most relevant conference in Nanoimprint techniques. The abstract deadline was extended to August 1st, poster submissions only. Hope to see you in NNT!
Abstract deadline extended on NNT 2013
This year, Barcelona will host the Nanoprint and Nanoimprint Technology (NNT) international conference, the most relevant conference in Nanoimprint techniques. The abstract deadline was extended to August 1st, poster submissions only. Hope to see you in NNT!
Functional printing for smart surfaces 