Posts Tagged: Simao
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Novel NIL methodology improves ordering in periodic arrays from BCPs
Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up
Line pattern analysis featured on Nanotech-Now.com
The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170
Line pattern analysis featured on Nanotech-Now.com
The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170
Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)
At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.
Image analysis software for nanometer line patterns from Block copolymers DSA (and not only…)
At last week’s SPIE Advanced Lithography (San Jose, CA), ICN2 scientists announced pioneering software for line pattern image analysis. The presented methodology is a unique tool developed to address the gap existent in dimensional metrology of sub-10 nm line patterns.
Presentation at SPIE Advanced Lithography (San Jose, CA) February 2014
A presentation of the novel nanometrology method of block copolymer nanostructures developed in P2N will be held at SPIE Advanced Lithography 2014. http://spie.org/x10942.xml Looking forward to meet there.
Presentation at SPIE Advanced Lithography (San Jose, CA) February 2014
A presentation of the novel nanometrology method of block copolymer nanostructures developed in P2N will be held at SPIE Advanced Lithography 2014. http://spie.org/x10942.xml Looking forward to meet there.
Functional printing for smart surfaces 