Posts Tagged: Sotomayor

Nanofibrillated cellulose: major overall assessment of physico-chemical properties for novel applications!

We have a just published paper on the optical and mechanical properties of NanoFibrillated Cellulose entitled:”Optical and mechanical properties of nanofibrillated cellulose: towards a robust platform for next-generation green technologies.” by Simao et al. This material is extracted from cellulose,

Nanofibrillated cellulose: major overall assessment of physico-chemical properties for novel applications!

We have a just published paper on the optical and mechanical properties of NanoFibrillated Cellulose entitled:”Optical and mechanical properties of nanofibrillated cellulose: towards a robust platform for next-generation green technologies.” by Simao et al. This material is extracted from cellulose,

ICN2 Open Knowledge seminars: Introductory lectures on Raman spectroscopy – Part I November 7, 2014

A good initiative will kick-off on ICN2 next week: open seminars will be given on topics carried out at ICN2. The sessions will start with P2N group on “How can we use photons to study the properties of condensed matter?”

ICN2 Open Knowledge seminars: Introductory lectures on Raman spectroscopy – Part I November 7, 2014

A good initiative will kick-off on ICN2 next week: open seminars will be given on topics carried out at ICN2. The sessions will start with P2N group on “How can we use photons to study the properties of condensed matter?”

Novel NIL methodology improves ordering in periodic arrays from BCPs

Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up

Novel NIL methodology improves ordering in periodic arrays from BCPs

Our paper on a new methodology that consists on in situ solvent-assisted nanoimprint lithography of block copolymers has been recently published as cover article of IOP Nanotechnogy. This technique combines a top-down approach – nanoimprint lithography – with a bottom-up

Line pattern analysis featured on Nanotech-Now.com

The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170

Line pattern analysis featured on Nanotech-Now.com

The recently released software specialized in image analysis of Line Patterns of DSA has been featured in Nanotech-Now. Read all about it here: http://www.nanotech-now.com/news.cgi?story_id=49170